3D Lithography, Etching, and Deposition Simulation (Sample-3D)

Publisher Website

1 January 1991

conference paper
Published by Institute of Electrical and Electronics Engineers (IEEE)

p. 97-98
https://doi.org/10.1109/vlsit.1991.706008

Abstract

No abstract available

Keywords

This publication has 7 references indexed in Scilit:

Three-dimensional topography simulation model: etching and lithography
IEEE Transactions on Electron Devices, 1990
A two-dimensional computer simulation for dry etching using Monte Carlo techniques
Journal of Applied Physics, 1989
A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect Environment
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1987
Identifying And Monitoring Effects Of Lens Aberrations In Projection Printing
Published by SPIE-Intl Soc Optical Eng ,1987
Three-dimensional photoresist image simulation on flat surfaces
IEEE Transactions on Electron Devices, 1985
A general simulator for VLSI lithography and etching processes: Part II—Application to deposition and etching
IEEE Transactions on Electron Devices, 1980
Modeling projection printing of positive photoresists
IEEE Transactions on Electron Devices, 1975