Postbreakdown reanodization of tantalum
- 1 July 1981
- journal article
- Published by Springer Nature in Journal of Applied Electrochemistry
- Vol. 11 (4) , 525-530
- https://doi.org/10.1007/bf01132441
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Electrical Breakdown: I . During the Anodic Growth of Tantalum PentoxideJournal of the Electrochemical Society, 1980
- Scintillation in anodic Ta2O5 filmsThin Solid Films, 1979
- Interfacial control of the electronic current through the barrier-type anodic films in contact with an electrolyteJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1978
- Theory of electrical breakdown during formation of barrier anodic filmsElectrochimica Acta, 1977
- Field crystallization of anodic films on tantalumJournal of Applied Electrochemistry, 1973
- Nuclear Study of the Fluorine Contamination of Tantalum by Various Polishing Procedures and of Its Behavior during Subsequent Anodic OxidationJournal of the Electrochemical Society, 1972
- Experimental evaluation of some electrolytic breakdown hypothesesElectrochimica Acta, 1971
- The Crystallization of Anodic Tantalum Oxide Films in the Presence of a Strong Electric FieldJournal of the Electrochemical Society, 1955