Film formation technique by ionized-cluster beam
- 1 May 1981
- journal article
- Published by Elsevier in Surface Science
- Vol. 106 (1-3) , 544-550
- https://doi.org/10.1016/0039-6028(81)90249-1
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Optical and thermal properties of BeO thin films prepared by reactive ionized-cluster beam techniqueJournal of Applied Physics, 1980
- New developments in ionized-cluster beam and reactive ionized-cluster beam deposition techniquesThin Solid Films, 1979
- Properties of ZnO films prepared by reactive ionized cluster beam depositionSurface Science, 1979
- Thin film deposition from beams of ionized atoms and clustersJournal of Crystal Growth, 1978
- Cadmium telluride layer deposition using the ionized cluster beam techniqueJournal of Crystal Growth, 1977
- An evaluation of metal and semiconductor films formed by ionized-cluster beam depositionThin Solid Films, 1976
- Ionized-cluster beam depositionJournal of Vacuum Science and Technology, 1975