Plasma nitrogen doping efficiency in molecular beam epitaxy of tellurium-based II–VI compounds
- 2 February 1996
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 159 (1-4) , 271-275
- https://doi.org/10.1016/0022-0248(95)00791-1
Abstract
No abstract availableKeywords
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