Characterization and application of a UV-based imprint technique
- 1 September 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 57-58, 361-366
- https://doi.org/10.1016/s0167-9317(01)00536-6
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Fabrication of nanostructures using a UV-based imprint techniqueMicroelectronic Engineering, 2000
- Step and flash imprint lithography: a new approach to high-resolution patterningPublished by SPIE-Intl Soc Optical Eng ,1999
- Nanoimprint lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996