Band bending and Fermi level shifts in phosphorus-doped hydrogenated amorphous silicon studied by X-ray photoelectron spectroscopy
- 2 November 1991
- journal article
- Published by Elsevier in Surface Science
- Vol. 258 (1-3) , 190-196
- https://doi.org/10.1016/0039-6028(91)90913-d
Abstract
No abstract availableKeywords
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