Comparative study of anneal-induced modifications of amorphous carbon films deposited by dc magnetron sputtering at different argon plasma pressures
- 1 April 2000
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 9 (3-6) , 680-684
- https://doi.org/10.1016/s0925-9635(99)00341-6
Abstract
No abstract availableKeywords
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