The growth behaviour of epitaxial NiSi2 islands of A- and B-types during the reaction of nickel vapour with the Si(111) surface
- 16 November 1989
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 116 (1) , 67-80
- https://doi.org/10.1002/pssa.2211160108
Abstract
No abstract availableKeywords
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