Thickness dependence of the preferred orientation of Mn–Zn ferrite thin films deposited by ion-beam sputtering

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Abstract
The thickness dependence of the preferred orientation of the Cu or Ti added Mn–Zn ferrite thin films deposited on SiO2(1000 Å)/Si(100) at 350 °C by ion‐beam sputtering was investigated. A mosaic target, consisting of a single‐crystal (110) Mn–Zn ferrite with a metal strip on it, was employed as the target. The (hhh) preferred orientation, formed at the initial growth stage, of the Cu added Mn–Zn ferrite film changed to the (h00) preferred orientation with increasing film thickness, while the initially formed (h00) preferred orientation of the Ti added one was enhanced with increasing film thickness. Such different behaviors were discussed in terms of the surface energy and the preferred growth orientation of the ferrite film. The thickness dependence of magnetic properties of the ferrite films was also investigated.