A statistical model for step and ramp voltage breakdown tests in thin insulators
- 1 July 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 35 (3) , 321-326
- https://doi.org/10.1016/0040-6090(76)90198-x
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Thin−film breakdown counter of fission fragmentsJournal of Applied Physics, 1975
- The dielectric breakdown of anodic aluminum oxidePhysics Letters A, 1974
- Comparison of step and ramp voltage breakdown tests in aluminum oxide filmsThin Solid Films, 1972
- A theory of localized electronic breakdown in insulating filmsAdvances in Physics, 1972
- Electrical Breakdown in SolidsPublished by Elsevier ,1969