Plasma characteristics observed through high-aspect-ratio holes in plasma
- 1 May 1996
- journal article
- Published by IOP Publishing in Plasma Sources Science and Technology
- Vol. 5 (2) , 121-125
- https://doi.org/10.1088/0963-0252/5/2/002
Abstract
Ion species and their energy distributions impinging on a powdered electrode are investigated through high-aspect-ratio holes in the plasma of a magnetron etcher. A decrease in ion current and a change in ion energy distribution depending on the aspect ratio of holes were observed. The effects of inclined ion trajectory and charging at the side wall were examined theoretically and experimentally. It was found that the charging and a deposit on the side wall of holes greatly influenced the ions passing through holes.Keywords
This publication has 12 references indexed in Scilit:
- Local Electric Field Effect in Reactive Ion EtchingJapanese Journal of Applied Physics, 1993
- Bombardment energies of O2+ in low pressure reactive ion etchingApplied Physics Letters, 1992
- Charging of pattern features during plasma etchingJournal of Applied Physics, 1991
- Image potentials and the dry etching of submicron trenches with low-energy ionsApplied Physics Letters, 1991
- Measurement of ion impact energy and ion flux at the rf electrode of a parallel plate reactive ion etcherJournal of Applied Physics, 1991
- Measurement of ion energy distributions at the powered rf electrode in a variable magnetic fieldJournal of Applied Physics, 1990
- Plasma potentials of 13.56-MHz rf argon glow discharges in a planar systemJournal of Applied Physics, 1985
- Positive-ion bombardment of substrates in rf diode glow discharge sputteringJournal of Applied Physics, 1972
- Energy Dispersion of Positive Ions Effused from an RF PlasmaJournal of the Physics Society Japan, 1970
- Anomalies of the Energy of Positive Ions Extracted from High-Frequency Ion Sources. A Theoretical StudyJournal of Applied Physics, 1968