Use of lithographically defined metal masks in selective chemical etching of patterns in thin films: microelectronic applications
- 1 December 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 206 (1-2) , 269-274
- https://doi.org/10.1016/0040-6090(91)90434-y
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Aerosol jet etching of fine patternsApplied Physics Letters, 1987