Properties of a-Si : H : F deposited in SiF4/SiH4/Ar Gas mixtures by a glow-discharge technique
- 1 November 1980
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 41 (2) , 151-159
- https://doi.org/10.1016/0022-3093(80)90160-x
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Electrical and optical properties of amorphous Si:F:H alloysPhilosophical Magazine Part B, 1979
- Properties of heavily doped GDSi with low resistivityJournal of Non-Crystalline Solids, 1979
- Chemical effects on the frequencies of Si-H vibrations in amorphous solidsSolid State Communications, 1979
- A new amorphous silicon-based alloy for electronic applicationsNature, 1978
- Infrared and Raman spectra of the silicon-hydrogen bonds in amorphous silicon prepared by glow discharge and sputteringPhysical Review B, 1977
- Reversible conductivity changes in discharge-produced amorphous SiApplied Physics Letters, 1977