Metastable ion study of organosilicon compounds. Part III—trimethoxyphenylsilane
- 1 September 1990
- journal article
- research article
- Published by Wiley in Journal of Mass Spectrometry
- Vol. 25 (9) , 441-445
- https://doi.org/10.1002/oms.1210250902
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Metastable ion study of organosilicon compounds part II—hexamethyldisiloxaneJournal of Mass Spectrometry, 1990
- Unimolecular decomposition of ethoxytrimethylsilaneJournal of Mass Spectrometry, 1989
- Metastable ion study of organosilicon compounds. Part I—DiethoxydimethylsilaneJournal of Mass Spectrometry, 1989
- The mechanism of methyl loss from ionized methoxypentamethyldisilane: anchimeric assistance versus direct bond cleavage.Journal of Organometallic Chemistry, 1987
- The mass spectra of some hexaalkyl disiloxanesInternational Journal of Mass Spectrometry and Ion Physics, 1983
- Mechanisms of unimolecular fragmentations of odd‐electron cations in the gas phase: The importance of intramolecular hydrogen migration for [odd]+˙ → [even]+ transitionsJournal of Mass Spectrometry, 1980
- Chemistry of organosilicon compoundsJournal of Organometallic Chemistry, 1976
- Mass spectrometric study of hexamethyldisilazane and some of itsN-substituted derivativesJournal of Mass Spectrometry, 1975
- A convenient synthesis of 1,2-dimethyltetramethoxydisilaneJournal of Organometallic Chemistry, 1975
- Methylgruppenwanderung bei der Elektronenstoßfragmentierung von TrimethyläthoxysilanZeitschrift für Chemie, 1970