Particle formation and a-Si:H film deposition in narrow-gap RF plasma CVD
- 1 May 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 345 (1) , 80-84
- https://doi.org/10.1016/s0040-6090(99)00100-5
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Simultaneous in situ measurements of properties of particulates in rf silane plasmas using a polarization-sensitive laser-light-scattering methodJournal of Applied Physics, 1996
- Defect formation during growth of hydrogenated amorphous siliconPhysical Review B, 1993
- Direct visual observation of powder dynamics in rf plasma-assisted depositionApplied Physics Letters, 1991
- Particulates in aluminum sputtering dischargesJournal of Applied Physics, 1990
- Effects of low-frequency modulation on rf discharge chemical vapor depositionApplied Physics Letters, 1988
- Photothermal and photoconductive determination of surface and bulk defect densities in amorphous silicon filmsApplied Physics Letters, 1987