Aerosol‐assisted chemical vapor deposition (AACVD) of silver, palladium and metal alloy (Ag1−xPdx, Ag1−xCux and Pd1−xCux) Films
- 1 October 1994
- journal article
- Published by Wiley in Advanced Materials
- Vol. 6 (10) , 746-748
- https://doi.org/10.1002/adma.19940061005
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Allyl(?-diketonato)palladium(II) complexes as precursors for palladium filmsAdvanced Materials, 1994
- Surface-selective deposition of palladium and silver films from metal-organic precursors: a novel metal-organic chemical vapor deposition redox transmetalation processJournal of the American Chemical Society, 1993
- Glow-discharge enhanced permeation of oxygen through silverJournal of Applied Physics, 1993
- New precursors for chemical vapor deposition of silverChemistry of Materials, 1993
- Preparation of palladium-silver alloy membranes for hydrogen separation by the spray pyrolysis methodJournal of Membrane Science, 1993
- Chemical vapor deposition of silver films for superconducting wire applicationsJournal of Alloys and Compounds, 1992
- Supercritical fluid transport-chemical deposition of filmsChemistry of Materials, 1992
- Reaction pathways in organometallic chemical vapor deposition(OMCVD)Advanced Materials, 1992
- Catalytic palladium‐based membrane reactors: A reviewThe Canadian Journal of Chemical Engineering, 1991
- Thin layers deposited by the pyrosol processThin Solid Films, 1981