High-flux beamline for small-angle x-ray scattering at ELETTRA

Abstract
The optical layout and the expected performance of the new high‐flux SAXS beamline at ELETTRA is presented. From the high‐power wiggler spectrum the three discrete energies 5.4, 8, and 16 keV will be selected with a double‐crystal monochromator which contains three pairs of separated asymmetrically cut plane Si(111) crystals. Downstream, the beam will be focused by a torodial mirror. The optical axis of the beamline will be horizontally 1.25 mrad off wiggler axis and the beamline will accept about 1 mrad horizontally and 0.3 mrad vertically. The beamline will operate with a SAXS resolution between 10 and at least 1000 Å in d spacing at 8 keV and has been optimized with respect to extreme flux. A flux at the sample in the order of 1013 ph/s is expected for 8 keV photons (2 GeV, 400 mA). It will be possible to perform wide angle scattering measurements in the range of 3.5 and 7 Å d spacing at 8 keV simultaneously.

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