Influence of the nonequilibrium vacancies on the diffusion of phosphorus into silicon
- 1 April 1982
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 53 (4) , 3053-3058
- https://doi.org/10.1063/1.331049
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Numerical Solution of Phosphorus Diffusion Equation in SiliconJapanese Journal of Applied Physics, 1979
- Long-range enhancement of boron diffusivity induced by a high-surface-concentration phosphorus diffusionApplied Physics Letters, 1979
- Discussion of “A Quantitative Model for the Diffusion of Phosphorus in Silicon and the Emitter Dip Effect” [R. B. Fair and J. C. C. Tsai pp. 1107–1118, Vol. 124, No. 7]Journal of the Electrochemical Society, 1978
- A Quantitative Model for the Diffusion of Phosphorus in Silicon and the Emitter Dip EffectJournal of the Electrochemical Society, 1977
- Comparison of theory with quenching experiments for the entropy and enthalpy of vacancy formation in Si and GePhysical Review B, 1976
- The chemical diffusion of P in SiPhysica Status Solidi (a), 1975
- Enthalpy of vacancy migration in Si and GePhysical Review B, 1974
- Theoretical calculations of the Fermi level and of other parameters in phosphorus doped silicon at diffusion temperaturesIEEE Transactions on Electron Devices, 1974
- Electrical Properties of Silicon Containing Arsenic and BoronPhysical Review B, 1954