Themodynamic Approach to Diffusion‐Controlled Epitaxial Silicon Deposition in Flow System from SiCl4 + H2 Mixtures
- 1 January 1972
- journal article
- research article
- Published by Wiley in Crystal Research and Technology
- Vol. 7 (9) , 981-997
- https://doi.org/10.1002/crat.19720070903
Abstract
No abstract availableKeywords
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