Time resolved ultraviolet absorption spectroscopy of pulsed fluorocarbon plasmas
- 15 January 2001
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 89 (2) , 915-922
- https://doi.org/10.1063/1.1334936
Abstract
No abstract availableThis publication has 33 references indexed in Scilit:
- Uses of High-Sensitivity White-Light Absorption Spectroscopy in Chemical Vapor Deposition and Plasma ProcessingPublished by Elsevier ,2000
- Fluorinated amorphous carbon films for low permittivity interlevel dielectricsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999
- High mass positive ions and molecules in capacitively-coupled radio-frequency CF4 plasmasJournal of Applied Physics, 1999
- Optical and electrical diagnostics of fluorocarbon plasma etching processesPlasma Sources Science and Technology, 1999
- Surface science issues in plasma etchingIBM Journal of Research and Development, 1999
- Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopyPlasma Sources Science and Technology, 1998
- Pulsed plasma-enhanced chemical vapor deposition from hexafluoropropylene oxide: Film composition studyJournal of Applied Polymer Science, 1998
- High-resolution infrared spectroscopy of etching plasmasPlasma Sources Science and Technology, 1995
- Role of the chamber wall in low-pressure high-density etching plasmasJournal of Applied Physics, 1995
- Ultraviolet absorption spectroscopy for the detection of CF2 in high-density plasmasJournal of Applied Physics, 1994