Electron beam lithography resolution upon exposure of superthick resist layers
- 31 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4) , 231-233
- https://doi.org/10.1016/0167-9317(89)90054-3
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- X-ray exposure characteristics of diazo-type photoresist using synchrotron radiationMicroelectronic Engineering, 1986