Influence of substrate topography on the nucleation of diamond thin films
- 23 September 1991
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 59 (13) , 1562-1564
- https://doi.org/10.1063/1.106283
Abstract
We have investigated the effect of substrate topography on nucleation behavior by producing a variety of substrate features on molybdenum and silicon substrates. The initial stages of nucleation on these substrates were studied by exposing them to similar conditions in a hot filament chemical vapor deposition reactor. For these materials, nucleation is favored on prominent features of the substrate; that is, features that protrude with sharp edges or apexes, as opposed to sharp valleys or flat regions. Several possible explanations are given for this behavior.Keywords
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