Comparison of Amorphous and Quasicrystalline Films of Sputtered ${\mathrm{Al}}_{0.72}$${\mathrm{Mn}}_{0.22}$${\mathrm{Si}}_{0.06}$

X-ray data were collected on films of ${\mathrm{Al}}_{0.72}$ ${\mathrm{Mn}}_{0.22}$ ${\mathrm{Si}}_{0.06}$ sputtered on NaCl at 45, 150, and 230 °C. The 45 °C films show a typical metallic-glass structure factor, $S\left(Q\right)\mathrm{}$, while at 230 °C the structure is quasicrystalline plus Al. A combined particle-size and phason strain broadening was applied to the normalized and reduced $S\left(Q\right)\mathrm{}$ for the 230 °C film to bring it essentially into coincidence with the amorphous (45 °C) $S\left(Q\right)\mathrm{}$ leading us to conclude that the glass, or amorphous, phase represents a defect limit of the quasicrystal.