Deep reactive ion etching of Pyrex glass using SF6 plasma
Top Cited Papers
- 26 December 2000
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 87 (3) , 139-145
- https://doi.org/10.1016/s0924-4247(00)00482-9
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology
This publication has 6 references indexed in Scilit:
- Deep Reactive Ion Etching of Lead Zirconate Titanate Using Sulfur Hexafluoride GasJournal of the American Ceramic Society, 1999
- Deep wet etching of borosilicate glass using an anodically bonded silicon substrate as maskJournal of Micromechanics and Microengineering, 1998
- Non-traditional technologies for microfabricationJournal of Micromechanics and Microengineering, 1995
- Encapsulated micro mechanical sensorsMicrosystem Technologies, 1994
- Review of inductively coupled plasmas for plasma processingPlasma Sources Science and Technology, 1992
- Characterization of reactive ion etching of glass and its applications in integrated opticsJournal of Vacuum Science & Technology A, 1991