Low-temperature deposition of diamond using chloromethane in a hot-filament chemical vapor deposition reactor
- 31 March 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (2-4) , 365-372
- https://doi.org/10.1016/0925-9635(93)90084-f
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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