In Situ Multi-Wavelength Ellipsometric Control of Thickness and Composition For Bragg Reflector Structures
- 1 January 1995
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Data analysis for spectroscopic ellipsometryThin Solid Films, 1993
- Real-time monitoring and control during MOVPE growth of CdTe using multiwavelength ellipsometryThin Solid Films, 1993
- Minimal-data approaches for determining outer-layer dielectric responses of films from kinetic reflectometric and ellipsometric measurementsJournal of the Optical Society of America A, 1993
- Automatic rotating element ellipsometers: Calibration, operation, and real-time applicationsReview of Scientific Instruments, 1990
- Low-retardance fused-quartz window for real-time optical applications in ultrahigh vacuumJournal of Vacuum Science & Technology A, 1989
- Systematic and random errors in rotating-analyzer ellipsometryJournal of the Optical Society of America A, 1988
- Variable angle of incidence spectroscopic ellipsometry: Application to GaAs-AlxGa1−xAs multiple heterostructuresJournal of Applied Physics, 1986