Defect annealing in polycrystalline silicon films
- 1 August 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 52 (3) , 329-332
- https://doi.org/10.1016/0040-6090(78)90175-x
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Chemically Vapor Deposited Polycrystalline-Silicon FilmsIEEE Transactions on Parts, Hybrids, and Packaging, 1974
- The preparation and properties of elemental semiconductor thin filmsThin Solid Films, 1973
- Electron Spin Resonance Studies on Ion-Implanted Silicon. I. AmorphisationJapanese Journal of Applied Physics, 1973