Reversible electron-beam writing on a submicron scale in a superionic amorphous film
- 27 September 1993
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 63 (13) , 1801-1803
- https://doi.org/10.1063/1.110667
Abstract
The direct writing of patterns in amorphous silver chalcogenide materials by electron‐beam exposure is reported. At sufficiently low beam‐current densities, the written patterns comprise regions depleted of silver; complete hole drilling of films does not occur. The phenomenon is postulated to arise from a combination of thermal gradient and electronic excitation effects.Keywords
This publication has 7 references indexed in Scilit:
- Electron beam writing in thin films of highly conducting solid electrolytes RbAg4I5and CsAg4Br3−xI2+xPhilosophical Magazine Letters, 1993
- Photodoping of amorphous chalcogenides by metalsAdvances in Physics, 1991
- A unified mechanism for metal photodissolution in amorphous chalcogenide materialsJournal of Non-Crystalline Solids, 1991
- Photodissolution of silver in amorphous germanium sulphide filmsJournal of Non-Crystalline Solids, 1991
- Nanolithography using field emission and conventional thermionic electron sourcesUltramicroscopy, 1989
- Electron beam-induced structural changes in amorphous GeSAg filmsJournal of Non-Crystalline Solids, 1985
- Electron beam writing on a 20-Å scale in metal β-aluminasApplied Physics Letters, 1983