Nickel and cobalt silicides on silicon: Thin-film reaction and interface structure
- 1 September 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 38 (1-4) , 13-26
- https://doi.org/10.1016/0169-4332(89)90514-x
Abstract
No abstract availableThis publication has 63 references indexed in Scilit:
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