Deposition of amorphous hydrogenated semiconductors by magnetron assisted silane decomposition
- 1 April 1991
- journal article
- Published by Elsevier in Physica B: Condensed Matter
- Vol. 170 (1-4) , 571-573
- https://doi.org/10.1016/0921-4526(91)90180-m
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Preparation and Properties of a-Si Films Deposited at a High Deposition Rate under a Magnetic FieldJapanese Journal of Applied Physics, 1988