Atomic Layer Deposition and Chemical Vapor Deposition of Tantalum Oxide by Successive and Simultaneous Pulsing of Tantalum Ethoxide and Tantalum Chloride
- 23 June 2000
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 12 (7) , 1914-1920
- https://doi.org/10.1021/cm001017j
Abstract
No abstract availableKeywords
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