Atomic layer epitaxy - a valuable tool for nanotechnology?

This publication has 44 references indexed in Scilit:

• Growth of SiO ₂ at Room Temperature with the Use of Catalyzed Sequential Half-Reactions
  Science, 1997
• Advanced ALE processes of amorphous and polycrystalline films
  Applied Surface Science, 1997
• Synthesis of oxide thin films and overlayers by atomic layer epitaxy for advanced applications
  Materials Science and Engineering: B, 1996
• Atomic-Layer Chemical-Vapor-Deposition of SiO ₂ by Cyclic Exposures of CH ₃OSi(NCO) ₃ and H ₂O ₂
  Japanese Journal of Applied Physics, 1995
• Atomic layer growth of SiO2 on Si(100) using SiCl4 and H2O in a binary reaction sequence
  Surface Science, 1995
• Atomic layer epitaxy (ALE) on porous substrates
  Applied Surface Science, 1994
• Dispersion and distribution of titanium species bound to silica from titanium tetrachloride
  Langmuir, 1993
• An IR and NMR study of the chemisorption of titanium tetrachloride on silica
  The Journal of Physical Chemistry, 1993
• Analytical and chemical techniques in the study of surface species in atomic layer epitaxy
  Thin Solid Films, 1993
• Atomic layer epitaxy
  Materials Science Reports, 1989