Gap control in the fabrication of quantum-effect devices using X-ray nanolithography
- 4 February 1995
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 27 (1-4) , 307-310
- https://doi.org/10.1016/0167-9317(94)00113-9
Abstract
No abstract availableKeywords
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