The influence of substrate temperature and sputtering gas atmosphere on the electrical properties of reactively sputtered indium tin oxide films
- 1 January 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 135 (2) , 219-228
- https://doi.org/10.1016/0040-6090(86)90129-x
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
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