Langmuir probe studies of the glow discharge in an rf sputtering system at various frequencies
- 1 January 1979
- Vol. 29 (11) , 443-445
- https://doi.org/10.1016/s0042-207x(79)80894-5
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Experimental and design information for calculating impedance matching networks for use in rf sputtering and plasma chemistryVacuum, 1979
- Measurement of plasma discharge characteristics for sputtering applicationsJournal of Vacuum Science and Technology, 1978
- Positive-ion bombardment of substrates in rf diode glow discharge sputteringJournal of Applied Physics, 1972
- RF biasing through capacitive collector to target coupling in RF diode sputteringJournal of Physics E: Scientific Instruments, 1972