Control of the deposition temperature by the use of a magnetic field in r.f. sputtering
- 17 August 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 151 (3) , 397-402
- https://doi.org/10.1016/0040-6090(87)90138-6
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Evidence for Structure-Related Induced Anisotropy in Amorphous CoTi Soft Ferromagnetic Thin FilmsPhysical Review Letters, 1986
- Temperature Rise during Film Deposition by rf and dc SputteringJournal of Vacuum Science and Technology, 1972
- Sputtering Multilayered Conductor FilmsJournal of Vacuum Science and Technology, 1971
- RF Sputtering of Multilayer Thin FilmsJournal of Vacuum Science and Technology, 1969