Revival of interband crystalline reflectance from nanocrystallites in porous silicon by immersion plating
- 7 June 1999
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 74 (23) , 3483-3485
- https://doi.org/10.1063/1.124135
Abstract
We prepared porous silicon for which the UV reflectance (3.3–6 eV) is nearly eliminated, and exhibits no features at the Si interband bulk transitions 3.3, 4.3, and 5.5 eV. Plating with a thin layer of copper is found to cause recovery of the UV bulk-like crystalline reflectance and interband resonances. This provides evidence that the loss of crystalline absorption is reversible and is not due to a permanent loss in the crystalline structure. This may relate to a recent model in which the optical activity of ultra small nanocrystallites is produced by a new Si–Si crystalline configuration (or phase), distinct from but interconnected to the diamond-like configuration by a potential barrier.Keywords
This publication has 17 references indexed in Scilit:
- Photoexcitation of Si-Si surface states in nanocrystallitesPhysical Review B, 1997
- Ideal anodization of siliconApplied Physics Letters, 1997
- Electroless and electro-plating of Cu on SiMicroelectronic Engineering, 1997
- Photoexcitation of Si-Si Radiative Surface States in NanocrystallitesMRS Proceedings, 1997
- Nature of Luminescent Surface States of Semiconductor NanocrystallitesPhysical Review Letters, 1996
- The influence of the doping level on the optical properties of porous siliconThin Solid Films, 1996
- Re-establishment of photoluminescence in Cu quenched porous silicon by acid treatmentJournal of Applied Physics, 1995
- Behavior of porous silicon emission spectra during quenching by immersion in metal ion solutionsApplied Physics Letters, 1994
- Spectroscopic ellipsometry characterisation of light-emitting porous silicon structuresApplied Surface Science, 1993
- Optical properties of thin filmsThin Solid Films, 1982