Quantitative AES analysis of Ti silicide and Co silicide films

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Abstract
The possibilities for quantitative Auger analysis in the derivative mode of Ti and Co silicide films are examined as a function of the composition. Both matrix and sputter corrections are taken into account. It is shown that the theoretical expressions for both corrections predict a weak composition dependence. However, the quantitative results obtained with this procedure strongly deviate from Rutherford backscattering spectroscopy and X‐ray diffraction measurements. It is concluded that the sputter and matrix corrections cannot sucessfully be applied for these materials. Experimental matrix and sputter correction factors are determined.