Laser Multiphoton Ionization Spectrum of AlCH3 Radicals Formed by UV Excimer Laser Photolysis of Gaseous TMA at 248 nm and 193 nm

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Abstract
The UV excimer laser photolysis of TMA, trimethylaluminum ((CH3)3Al)2, a dimer at room temperature, yields efficient generation of AlCH3 molecules, which have been detected and identified by tunable laser mass spectroscopy for the first time. Aluminum dimers are not detected. The AlCH3 molecules are not precursor of the Al atoms, which are also produced in high abundance. The efficient generation of a carbon containing aluminum compound 193 nm from TMA may be one important source of carbon incorporation into aluminum films formed by UV excimer laser photolysis of TMA as organometallic precursor.