Analysis of native oxide growth process on an atomically flattened and hydrogen terminated Si (111) surface in pure water using Fourier transformed infrared reflection absorption spectroscopy
- 1 January 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (1) , 375-381
- https://doi.org/10.1116/1.581008
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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