Gate Oxide Breakdown in a SOI CMOS Process Using MESA Isolation
- 1 January 1989
- book chapter
- Published by Springer Nature
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- CMOS devices and circuits made in lamp-ZMR SOI filmsMicroelectronic Engineering, 1988
- The Oxidation of Shaped Silicon SurfacesJournal of the Electrochemical Society, 1982
- Formation of Silicon Nitride at a Si ‐ SiO2 Interface during Local Oxidation of Silicon and during Heat‐Treatment of Oxidized Silicon in NH 3 GasJournal of the Electrochemical Society, 1976