Tunneling escape rate of electrons from quantum well in double-barrier heterostructures
- 16 November 1987
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 59 (20) , 2356-2359
- https://doi.org/10.1103/physrevlett.59.2356
Abstract
A tunneling escape rate 1/ of electrons from a single quantum well through thin barriers was successfully determined by measurement and analysis of the lifetime of electrons generated in 6.2-nm GaAs single quantum wells by a picosecond laser pulse. The measured was found to decrease systematically as the AlAs barrier thickness was reduced. The for <4 nm was found to agree very well with the lifetime predicted from the energy width of the resonance transmission. Irrelevance of coherence versus incoherence in the tunneling escape process is also pointed out.
Keywords
This publication has 11 references indexed in Scilit:
- Equivalence between resonant tunneling and sequential tunneling in double-barrier diodesApplied Physics Letters, 1987
- Atomistic models of interface structures of GaAs-Al Ga1−As (x = 0.2−1) quantum wells grown by interrupted and uninterrupted MBEJournal of Crystal Growth, 1987
- Resonant tunneling properties of heterostructuresSuperlattices and Microstructures, 1986
- Lifetime of Resonant State in a Resonant Tunneling SystemJapanese Journal of Applied Physics, 1986
- Tunneling through indirect-gap semiconductor barriersPhysical Review B, 1986
- Frequency limit of double-barrier resonant-tunneling oscillatorsApplied Physics Letters, 1985
- Resonant tunneling of holes in AlAs-GaAs-AlAs heterostructuresApplied Physics Letters, 1985
- Resonant tunneling through quantum wells at frequencies up to 2.5 THzApplied Physics Letters, 1983
- Resonant tunneling in semiconductor double barriersApplied Physics Letters, 1974
- Tunneling in a finite superlatticeApplied Physics Letters, 1973