Behavior of fused silica irradiated by low level 193 nm excimer laser for tens of billions of pulses
- 1 March 2000
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 265 (3) , 285-289
- https://doi.org/10.1016/s0022-3093(00)00009-0
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Excimer-laser-induced densification of fused silica:laser-fluence and material-grade effects on the scaling lawJournal of Non-Crystalline Solids, 1999
- Testing of optical materials for 193-nm applicationsPublished by SPIE-Intl Soc Optical Eng ,1998
- Densification of synthetic fused silica under ultraviolet irradiationJournal of Non-Crystalline Solids, 1997