A Photoluminescence Study of Amorphous-Microcrystalline Mixed-Phase Si:H Films

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Abstract
The results of photoluminescence (PL) experiments are presented for a series of amorphous-microcrystalline mixed-phase (µc-)Si:H films deposited under different rf voltages (RFV's). The present data combined with X-ray diffraction analyses lead to the conclusion that µc-Si:H involves three different components in its structure: microcrystals, a PL-emitting amorphous phase and a non-PL amorphous phase. The structure of the PL-emitting amorphous phase remains unchanged for a wide range of RFV, while its volume fraction varies.

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