Micromechanical properties of diamond films deposited by microwave-plasma-enhanced chemical vapour deposition
- 13 April 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (5-7) , 933-938
- https://doi.org/10.1016/0925-9635(93)90253-x
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experimentsJournal of Materials Research, 1992
- Submicron characterization of B-C:H thin films produced by RF plasma CVDDiamond and Related Materials, 1992
- Applications exploiting the extreme properties of diamondsMaterials Science and Engineering: B, 1992
- The effects of methane concentration in hydrogen on the microstructure and properties of diamond films grown by hot-filament chemical vapour depositionSurface and Coatings Technology, 1991
- Wear Characteristics and Cultlng Performance of Diamond Coated Ceramic ToolsSurface Engineering, 1991
- Ultralow-load indentation hardness and modulus of diamond films deposited by hot-filament-assisted CVDJournal of Materials Research, 1990
- Thin film characterization using a mechanical properties microprobeThin Solid Films, 1987
- The C K L L first-derivative x-ray photoelectron spectroscopy spectra as a fingerprint of the carbon state and the characterization of diamondlike carbon filmsJournal of Vacuum Science & Technology A, 1987
- The diamond surface: II. Secondary electron emissionSurface Science, 1977
- Smoothing and Differentiation of Data by Simplified Least Squares Procedures.Analytical Chemistry, 1964