Single crystal growth of titanium nitride by chemical vapour deposition and measurement of the linear growth rate on a (100) plane
- 29 February 1976
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 32 (2) , 141-148
- https://doi.org/10.1016/0022-0248(76)90025-7
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- The Vapor-Phase Deposition of Refractory MaterialsJournal of the Electrochemical Society, 1949
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- Methoden zur Reindarstellung hochschmelzender Carbide, Nitride und Boride und Beschreibung einiger ihrer EigenschaftenZeitschrift für anorganische und allgemeine Chemie, 1931
- Herstellung und Eigenschaften von NitridenZeitschrift für anorganische und allgemeine Chemie, 1925