The influence of deposition rate on the electrical properties of thin tellurium films
- 1 October 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 46 (2) , 223-228
- https://doi.org/10.1016/0040-6090(77)90066-9
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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