Amorphous GaP produced by ion implantation
- 1 January 1976
- journal article
- Published by Elsevier in Journal of Physics and Chemistry of Solids
- Vol. 37 (3) , 305-313
- https://doi.org/10.1016/0022-3697(76)90092-5
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- SENSITIVE TECHNIQUE FOR STUDYING ION-IMPLANTATION DAMAGEApplied Physics Letters, 1971
- Structural model for amorphous silicon and germaniumJournal of Non-Crystalline Solids, 1971
- ION-IMPLANTATION INDUCED OPTICAL ABSORPTION EDGE SHIFTS IN GaPApplied Physics Letters, 1970
- Optical Properties of Amorphous Germanium FilmsPhysical Review B, 1970
- implantation of Bi into GaP. II. channeling studiesRadiation Effects, 1970