Reactive unbalanced magnetron sputtering of the nitrides of Ti, Zr, Hf, Cr, Mo, Ti-Al, Ti-Zr and Ti-Al-V
- 3 December 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 61 (1-3) , 139-143
- https://doi.org/10.1016/0257-8972(93)90216-b
Abstract
No abstract availableKeywords
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