High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system
- 1 December 1990
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 43-44, 270-278
- https://doi.org/10.1016/0257-8972(90)90080-v
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
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